发明授权
- 专利标题： Formation of discontinuous films during an imprint lithography process
- 专利标题（中）： 在压印光刻过程中形成不连续膜
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申请号： US10194411申请日： 2002-07-11
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公开(公告)号： US06932934B2公开(公告)日： 2005-08-23
- 发明人: Byung Jin Choi , Mario J. Meissl , Sidlagata V. Sreenivasan , Michael P. C. Watts
- 申请人： Byung Jin Choi , Mario J. Meissl , Sidlagata V. Sreenivasan , Michael P. C. Watts
- 申请人地址： US TX Austin
- 专利权人： Molecular Imprints, Inc.
- 当前专利权人： Molecular Imprints, Inc.
- 当前专利权人地址： US TX Austin
- 代理商 Kenneth C. Brooks
- 主分类号： B29C35/08
- IPC分类号： B29C35/08 ; B29C59/02 ; H01L21/027 ; B29C33/42 ; B29C33/60 ; B29C35/12 ; B29C41/02 ; B29C41/20 ; B29C59/16
摘要：
The present invention is directed to methods for patterning a substrate by imprint lithography. An imprint lithography method includes placing a curable liquid on a substrate. A template may be contacted with the curable liquid. Surface forces at the interface of the curable liquid and the template cause the curable liquid to gather in an area defined by a lower surface of the template. Alternately, the curable liquid may fill one or more relatively shallow recesses in the template and the area under the template lower surface. Activating light is applied to the curable liquid to form a patterned layer on the substrate.
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