Invention Grant
- Patent Title: Manufacturing method and manufacturing apparatus for a gas discharge panel
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Application No.: US10616153Application Date: 2003-07-09
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Publication No.: US06935916B2Publication Date: 2005-08-30
- Inventor: Yoshiki Sasaki , Junichi Hibino , Hiroyosi Tanaka , Akira Shiokawa , Masafumi Ookawa
- Applicant: Yoshiki Sasaki , Junichi Hibino , Hiroyosi Tanaka , Akira Shiokawa , Masafumi Ookawa
- Applicant Address: JP Osaka-Fu
- Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee Address: JP Osaka-Fu
- Priority: JP11-320529 19991111
- Main IPC: H01J9/26
- IPC: H01J9/26 ; H01J9/38 ; H01J11/10 ; H01J11/12 ; H01J17/49 ; H01J9/32

Abstract:
A manufacturing method for a gas discharge panel according to the invention can reduce the amount of water and gaseous molecules, which are absorbed into the first and the second substrates, to a minimum by keeping the both substrates under a reduced pressure, and therefore can prevent a degradation of a discharge gas filling the finished panel. As a result, problems in the finished panel such as increase in a discharge starting voltage and generation of an abnormal discharge can be suppressed.
Public/Granted literature
- US20040053555A1 Manufacturing method and manufacturing apparatus for a gas discharge panel Public/Granted day:2004-03-18
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