发明授权
- 专利标题： Divided reticles for charged-particle-beam microlithography apparatus, and methods for using same
- 专利标题（中）： 用于带电粒子束微光刻设备的分割光罩及其使用方法
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申请号： US09860958申请日： 2001-05-17
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公开(公告)号： US06936831B2公开(公告)日： 2005-08-30
- 发明人: Tomoharu Fujiwara , Noriyuki Hirayanagi , Kazuaki Suzuki , Teruaki Okino
- 申请人： Tomoharu Fujiwara , Noriyuki Hirayanagi , Kazuaki Suzuki , Teruaki Okino
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Klarquist Sparkman, LLP
- 优先权： JP2000-147352 20000519
- 主分类号： G03F1/20
- IPC分类号： G03F1/20 ; G03F1/68 ; G03F7/16 ; G03F7/20 ; H01J37/305 ; H01J37/317 ; H01L21/027 ; H01J37/00 ; H01L21/30
摘要：
Reticles and apparatus for performing charged-particle-beam microlithography, and associated methods, are disclosed, in which the pattern to be transferred to a sensitive substrate is divided according to any of various schemes serving to improve throughput and pattern-transfer accuracy. The methods and apparatus are especially useful whenever a divided stencil reticle is used that includes complementary pattern portions.
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