发明授权
US06939434B2 Externally excited torroidal plasma source with magnetic control of ion distribution
失效
外部激发的环形等离子体源与磁控制的离子分布
- 专利标题: Externally excited torroidal plasma source with magnetic control of ion distribution
- 专利标题(中): 外部激发的环形等离子体源与磁控制的离子分布
-
申请号: US10164327申请日: 2002-06-05
-
公开(公告)号: US06939434B2公开(公告)日: 2005-09-06
- 发明人: Kenneth S. Collins , Hiroji Hanawa , Yan Ye , Kartik Ramaswamy , Andrew Nguyen , Michael S. Barnes , Huong Thanh Nguyen
- 申请人: Kenneth S. Collins , Hiroji Hanawa , Yan Ye , Kartik Ramaswamy , Andrew Nguyen , Michael S. Barnes , Huong Thanh Nguyen
- 申请人地址: US CA Santa Clara
- 专利权人: Applied Materials, Inc.
- 当前专利权人: Applied Materials, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理机构: Law Office of Robert M. Wallace
- 主分类号: H01J37/32
- IPC分类号: H01J37/32 ; C23C16/00 ; C23F1/00
摘要:
A plasma reactor is described that includes a vacuum chamber defined by an enclosure including a side wall and a workpiece support pedestal within the chamber defining a processing region overlying said pedestal. The chamber has at least a first pair of ports near opposing sides of said processing region and a first external reentrant tube is connected at respective ends thereof to the pair of ports. The reactor further includes a process gas injection apparatus (such as a gas distribution plate) and an RF power applicator coupled to the reentrant tube for applying plasma source power to process gases within the tube to produce a reentrant torroidal plasma current through the first tube and across said processing region. A magnet controls radial distribution of plasma ion density in the processing region, the magnet having an elongate pole piece defining a pole piece axis intersecting the processing region.
公开/授权文献
信息查询