发明授权
- 专利标题: Sample electrification measurement method and charged particle beam apparatus
- 专利标题(中): 样品充电测量方法和带电粒子束装置
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申请号: US10483596申请日: 2002-07-10
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公开(公告)号: US06946656B2公开(公告)日: 2005-09-20
- 发明人: Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
- 申请人: Makoto Ezumi , Yoichi Ose , Akira Ikegami , Hideo Todokoro , Tatsuaki Ishijima , Takahiro Sato , Ritsuo Fukaya , Kazunari Asao
- 申请人地址: JP
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP
- 代理机构: Dickstein Shapiro Morin Oshinsky LLP
- 优先权: JP2001-211532 20010712; JP2001-262641 20010831
- 国际申请: PCT/JP02/06994 WO 20020710
- 国际公布: WO03/00733 WO 20030123
- 主分类号: G01N23/00
- IPC分类号: G01N23/00 ; G01Q30/06 ; G01Q30/18 ; G01Q30/20 ; G21K7/00 ; H01J37/21 ; H01J37/28 ; H01J37/26
摘要:
The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices.To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.
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