发明授权
- 专利标题: Semiconductor memory cell and method of forming same
- 专利标题(中): 半导体存储单元及其形成方法
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申请号: US10808510申请日: 2004-03-25
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公开(公告)号: US06946704B2公开(公告)日: 2005-09-20
- 发明人: Hideyuki Matsuoka , Kiyoo Itoh , Motoyasu Terao , Satoru Hanzawa , Takeshi Sakata
- 申请人: Hideyuki Matsuoka , Kiyoo Itoh , Motoyasu Terao , Satoru Hanzawa , Takeshi Sakata
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Reed Smith LLP
- 代理商 Stanley P. Fisher, Esq.; Juan Carlos A. Marquez, Esq.
- 优先权: JP2002-024918 20020201
- 主分类号: G11C13/00
- IPC分类号: G11C13/00 ; H01L27/10 ; H01L27/105 ; H01L27/24 ; H01L45/00 ; H01L29/26
摘要:
A semiconductor memory cell and forming method thereof utilizes a vertical select transistor to eliminate the problem of a large cell surface area in memory cells of the related art utilizing phase changes. A memory cell with a smaller surface area than the DRAM device of the related art is achieved by the present invention. Besides low power consumption during read operation, the invention also provides phase change memory having low power consumption even during write operation. Phase change memory also has stable read-out operation.
公开/授权文献
- US20040179388A1 Semiconductor memory cell and method of forming same 公开/授权日:2004-09-16
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