- 专利标题: Photolithographic method and system for efficient mask usage in manufacturing DNA arrays
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申请号: US09824931申请日: 2001-04-03
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公开(公告)号: US06949638B2公开(公告)日: 2005-09-27
- 发明人: Michael P. Mittmann , Earl A. Hubbell
- 申请人: Michael P. Mittmann , Earl A. Hubbell
- 申请人地址: US CA Santa Clara
- 专利权人: Affymetrix, Inc.
- 当前专利权人: Affymetrix, Inc.
- 当前专利权人地址: US CA Santa Clara
- 代理商 William R. McCarthy, III; Philip L. McGarrigle; Alan B. Sherr
- 主分类号: B01J19/00
- IPC分类号: B01J19/00 ; C40B40/06 ; C40B60/14 ; G01N33/543 ; G03F1/00 ; G06F19/20 ; C07H21/00 ; C07H17/00 ; C12Q1/68 ; G01N33/52
摘要:
Systems, methods, and products are described for synthesizing probe arrays of polymers. A mask is used that includes reticle areas, each of which includes a number of reticles associated with a same synthesis area on a substrate. A method includes (a) aligning the mask with respect to the substrate so that a first reticle of a first reticle area is aligned with a first synthesis area and so that a second reticle of the first reticle area is aligned with a first discard area on the substrate; (b) coupling monomers on the first synthesis area at locations determined by the first reticle; (c) re-aligning the mask with respect to the substrate so that the second reticle is aligned with the first synthesis area; and (d) coupling monomers on the first synthesis area at locations determined by the second reticle. The monomers may be, for example, nucleotides, amino acids or saccharides.
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