发明授权
US06955074B2 Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
失效
平版印刷设备，校准方法，校准板，器件制造方法以及由此制造的器件
- 专利标题： Lithographic apparatus, method of calibration, calibration plate, device manufacturing method, and device manufactured thereby
- 专利标题（中）： 平版印刷设备，校准方法，校准板，器件制造方法以及由此制造的器件
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申请号： US10746141申请日： 2003-12-29
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公开(公告)号： US06955074B2公开(公告)日： 2005-10-18
- 发明人: Leon Martin Levasier , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Friso Klinkhamer , Gerrit Johannes Nijmeijer , Petra Albertina Margaretha Dekkers-Rog
- 申请人： Leon Martin Levasier , Anastasius Jacobus Anicetus Bruinsma , Jacob Fredrik Friso Klinkhamer , Gerrit Johannes Nijmeijer , Petra Albertina Margaretha Dekkers-Rog
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands, B.V.
- 当前专利权人： ASML Netherlands, B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F9/00 ; G01B21/00
摘要：
A method according to one embodiment of the invention may be performed using a calibration plate having at least one alignment marker and at least one height profile. First, the calibration plate is positioned using an alignment sensor. Then the height profile is measured by a height sensor. Then the calibration plate is rotated by substantially 180 degrees and the two operations are repeated. This procedure results in two measured height profiles, which are compared in order to find a best fit. The amount of shift performed to find the best fit is used to determine a distance between the alignment marker and the X,Y position of the measurement point of the height sensor.