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公开(公告)号：US08441617B2
公开(公告)日：2013-05-14
申请号：US13288714
申请日：2011-11-03
Applicant: Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
Inventor： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号：US06882405B2
公开(公告)日：2005-04-19
申请号：US10686641
申请日：2003-10-17
IPC: G01B9/02 , G01B11/00 , G01B11/02 , G01B11/245 , G01B11/25 , G01B11/30 , G03F7/207 , G03F7/22 , G03F9/00 , H01L21/027 , G03B27/52 , G03B27/32 , G03B27/42
CPC classification number: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
Abstract translation: 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。
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公开(公告)号：US07352440B2
公开(公告)日：2008-04-01
申请号：US11008576
申请日：2004-12-10
Applicant: Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
Inventor： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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公开(公告)号：US06924884B2
公开(公告)日：2005-08-02
申请号：US10683454
申请日：2003-10-14
Applicant: Marcus Emile Joannes Boonman , Petrus Johannes Maria Broodbakker , Gerrit Johannes Nijmeijer , Mingcheng Zong , Jozef Cornelus Antonius Roijers
Inventor： Marcus Emile Joannes Boonman , Petrus Johannes Maria Broodbakker , Gerrit Johannes Nijmeijer , Mingcheng Zong , Jozef Cornelus Antonius Roijers
CPC classification number: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
Abstract: In an off-axis leveling procedure a height map of a mask is generated at a measurement station. The height map is referenced to a physical reference surface of a mask support. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of the mask support to position the exposure area on the mask in best focus during exposure.
Abstract translation: 在离轴调平程序中，在测量站产生掩模的高度图。 高度图参考掩模支持的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定掩模支架的最佳高度和/或倾斜度，以便在曝光期间以最佳聚焦将曝光区域放置在掩模上。
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5.发明授权Lithographic apparatus, method of exposing a substrate, method of measurement, device manufacturing method, and device manufactured thereby 失效平版印刷设备，曝光基板的方法，测量方法，器件制造方法以及由此制造的器件公开(公告)号：US07835017B2
公开(公告)日：2010-11-16
申请号：US10583985
申请日：2004-12-22
Applicant: Theodorus Marinus Modderman , Nicolaas Antonius Allegondus Johannes Van Asten , Johan Maria Van Boxmeer , Gerrit Johannes Nijmeijer
Inventor： Theodorus Marinus Modderman , Nicolaas Antonius Allegondus Johannes Van Asten , Johan Maria Van Boxmeer , Gerrit Johannes Nijmeijer
IPC: G01B11/28
CPC classification number: G03B27/42 , G03F9/7003 , G03F9/7011 , G03F9/7019 , G03F9/7034
Abstract: A method of exposing a substrate (e.g. in a lithographic apparatus comprising a substrate table to support a substrate) according to one embodiment of the invention includes performing first and a second height measurement of a part of at least one substrate with a first and second sensor, generating and storing an offset error map based on a difference between the measurements; generating and storing a height map of portions of the substrate (or another substrate that has had a similar processing as the part) by performing height measurements with the first sensor and correcting this height map by means of the offset error map; and exposing the substrate (or the other substrate).
Abstract translation: 根据本发明的一个实施例的曝光衬底（例如，在包括衬底台的光刻设备中以支撑衬底）的方法包括使用第一和第二传感器执行至少一个衬底的一部分的第一和第二高度测量 基于所述测量之间的差产生和存储偏移误差图; 通过利用第一传感器执行高度测量并通过偏移误差图校正该高度图来生成和存储基板（或具有与该部分相似的处理的另一基板）的部分的高度图; 并使基板（或另一个基板）曝光。
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Patent Agency Ranking
6.发明授权System and method of measurement, system and method of alignment, lithographic apparatus and method 有权系统和测量方法，系统和对准方法，光刻设备和方法公开(公告)号：US07280228B2
公开(公告)日：2007-10-09
申请号：US10882685
申请日：2004-07-02
Applicant: Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Jeroen Thomas Broekhuijse , Sigurd Dressler , Edwin Eduard Nicolaas Josephus Krijnen , Robbert Edgar Van Leeuwen , Roeland Nicolaas Maria Vanneer , Cornelis Christiaan Ottens
Inventor： Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Jeroen Thomas Broekhuijse , Sigurd Dressler , Edwin Eduard Nicolaas Josephus Krijnen , Robbert Edgar Van Leeuwen , Roeland Nicolaas Maria Vanneer , Cornelis Christiaan Ottens
IPC: G01B11/14
CPC classification number: G03F9/7088 , G03F7/70808 , G03F7/70841 , G03F7/70858 , G03F9/7015 , G03F9/7096 , H01L21/682
Abstract: A lithographic apparatus includes a measurement system including at least one optical component and at least one electrical component. The electrical component is configured to dissipate heat. The optical component is mounted on a first frame of the apparatus, and the electrical component is mounted on a second frame of the apparatus that is thermally and mechanically decoupled from the first frame. An optical coupling is provided between the first frame and the second frame.
Abstract translation: 光刻设备包括测量系统，该测量系统包括至少一个光学部件和至少一个电气部件。 电气部件被配置为散热。 光学部件安装在设备的第一框架上，并且电气部件安装在与第一框架热和机械分离的设备的第二框架上。 在第一框架和第二框架之间设置光耦合器。
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公开(公告)号：US20120050740A1
公开(公告)日：2012-03-01
申请号：US13288714
申请日：2011-11-03
Applicant: CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
Inventor： CHRISTIAAN ALEXANDER HOOGENDAM , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willem Cornelia Maria Van Eijck
IPC: G01B11/00
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
Abstract translation: 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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公开(公告)号：US08077291B2
公开(公告)日：2011-12-13
申请号：US11907045
申请日：2007-10-09
Applicant: Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willern Cornelia Maria Van Eijck
Inventor： Christiaan Alexander Hoogendam , Gerrit Johannes Nijmeijer , Minne Cuperus , Petrus Anton Willern Cornelia Maria Van Eijck
CPC classification number: G03F7/70341 , G01B11/14 , G01B11/26 , G01B11/272 , G03F7/707 , G03F7/70716 , G03F7/70775 , G03F9/7011
Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
Abstract translation: 用于确定衬底的中心和卡盘中的凹陷的中心之间的偏移的方法包括向所述凹陷提供测试衬底，所述测试衬底具有小于所述凹陷的尺寸的尺寸，测量对准的位置 在凹陷期间测试基板的标记，并且从对准标记的位置确定基板的中心与凹陷的中心之间的偏移。
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公开(公告)号：US07206058B2
公开(公告)日：2007-04-17
申请号：US11324754
申请日：2006-01-04
Applicant: Theodorus Marinus Modderman , Gerrit Johannes Nijmeijer , Johannes Christiaan Maria Jasper
Inventor： Theodorus Marinus Modderman , Gerrit Johannes Nijmeijer , Johannes Christiaan Maria Jasper
CPC classification number: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7096
Abstract: In an off-axis levelling procedure a height map of the substrate is generated at a measurement station. The height map is referenced to a physical reference surface of the substrate table. The physical reference surface may be a surface in which is inset a transmission image sensor. At the exposure station the height of the physical reference surface is measured and related to the focal plane of the projection lens. The height map can then be used to determine the optimum height and/or tilt of substrate table to position the exposure area on the substrate in best focus during exposure. The same principles can be applied to (reflective) masks.
Abstract translation: 在离轴调平程序中，在测量站产生衬底的高度图。 高度图参考衬底台的物理参考表面。 物理参考表面可以是其中插入透射图像传感器的表面。 在曝光站，测量物理基准表面的高度并与投影透镜的焦平面相关。 然后可以使用高度图来确定衬底台的最佳高度和/或倾斜，以在曝光期间以最佳聚焦将曝光区域定位在衬底上。 相同的原理可以应用于（反射）掩模。
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10.发明授权Lithographic projection apparatus using catoptrics in an optical sensor system, optical arrangement, method of measuring, and device manufacturing method 有权在光学传感器系统中使用光学的光刻投影设备，光学布置，测量方法和器件制造方法公开(公告)号：US07116401B2
公开(公告)日：2006-10-03
申请号：US10740823
申请日：2003-12-22
Applicant: Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Roeland Nicolaas Maria Vanneer
Inventor： Gerrit Johannes Nijmeijer , Anastasius Jacobus Anicetus Bruinsma , Christiaan Alexander Hoogendam , Roeland Nicolaas Maria Vanneer
CPC classification number: G03F9/7026 , G03F9/70 , G03F9/7034 , G03F9/7049 , G03F9/7088
Abstract: A lithographic projection apparatus according to an embodiment of the invention includes a measurement system configured to determine a position of a target portion of a substrate, using at least one among an optical sensing operation and an optical detecting operation. The position is determined via an optical path that includes at least one catoptrical system arranged to have an imaging function of at least one dioptrical element.
Abstract translation: 根据本发明的实施例的光刻投影装置包括测量系统，其被配置为使用光学感测操作和光学检测操作中的至少一个来确定衬底的目标部分的位置。 通过光路确定位置，所述光路包括布置成具有至少一个屈光元件的成像功能的至少一个折射系统。
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