发明授权
- 专利标题： Charged particle beam apparatus and charged particle beam irradiation method
- 专利标题（中）： 带电粒子束装置和带电粒子束照射法
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申请号： US10656166申请日： 2003-09-08
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公开(公告)号： US06956211B2公开(公告)日： 2005-10-18
- 发明人: Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
- 申请人： Mitsugu Sato , Hideo Todokoro , Yoichi Ose , Makoto Ezumi , Noriaki Arai , Takashi Doi
- 申请人地址： JP Tokyo
- 专利权人： Hitachi High-Technologies Corporation
- 当前专利权人： Hitachi High-Technologies Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Dickstein Shapiro Morin & Oshinsky LLP
- 优先权： JP2002-265842 20020911; JP2003-305267 20030828
- 主分类号： G01Q10/00
- IPC分类号： G01Q10/00 ; G01Q20/02 ; G01Q30/02 ; H01J3/14 ; H01J29/70 ; H01J37/153 ; H01J37/28
摘要：
A charged particle beam apparatus produces little reduction in resolution when the beam is inclined with respect to a sample. The trajectory of a primary beam 4 is deflected by a deflector or changed by a movable aperture such that the beam is incident on a plurality of lenses 6 and 7 off the axes thereof. A means is provided to control the off-axis trajectory of the beam such that an aberration produced by the objective lens 7 when the beam is inclined can be canceled by an aberration produced by the other lens 6.
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