Invention Grant
US06958513B2 Floating-gate memory cell having trench structure with ballistic-charge injector, and the array of memory cells
有权
具有带弹道电荷注入器的沟槽结构的浮栅存储器单元和存储单元阵列
- Patent Title: Floating-gate memory cell having trench structure with ballistic-charge injector, and the array of memory cells
- Patent Title (中): 具有带弹道电荷注入器的沟槽结构的浮栅存储器单元和存储单元阵列
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Application No.: US10457249Application Date: 2003-06-06
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Publication No.: US06958513B2Publication Date: 2005-10-25
- Inventor: Chih-Hsin Wang
- Applicant: Chih-Hsin Wang
- Main IPC: H01L21/8247
- IPC: H01L21/8247 ; H01L27/115 ; H01L29/423 ; H01L29/788 ; H01L31/062

Abstract:
A method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes an electrical conductive floating gate formed in a trench in a semiconductor substrate, and an electrical conductive control gate having a portion disposed over and insulated from the floating gate. An electrical conductive tunneling gate is disposed over and insulated from the control gate by an insulating layer to form a tri-layer structure permitting both electron and hole charges tunneling through at similar tunneling rate. Spaced apart source and drain regions are formed with the source region disposed adjacent to and insulated from a lower portion of the floating gate, and with the drain region disposed adjacent to and insulated from an upper portion of the floating gate with a channel region formed therebetween and along a sidewall of the trench.
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