Invention Grant
- Patent Title: Composite polymer dielectric film
- Patent Title (中): 复合聚合物电介质膜
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Application No.: US10816205Application Date: 2004-03-31
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Publication No.: US06962871B2Publication Date: 2005-11-08
- Inventor: Chung J. Lee , Atul Kumar
- Applicant: Chung J. Lee , Atul Kumar
- Applicant Address: US CA Fremont
- Assignee: Dielectric Systems, Inc.
- Current Assignee: Dielectric Systems, Inc.
- Current Assignee Address: US CA Fremont
- Agency: Alleman Hall McCoy Russell & Tuttle LLP
- Main IPC: H01L21/4763
- IPC: H01L21/4763 ; H01L23/58

Abstract:
An integrated circuit including a composite polymer dielectric layer formed on a substrate is disclosed, wherein the composite polymer dielectric layer includes a first silane-containing layer formed on the substrate, wherein the first silane-containing layer is formed at least partially from an organosilane material, a polymer dielectric layer formed on the first silane-containing layer, and a second silane-containing layer formed on the polymer dielectric layer. In some embodiments, the first silane-containing layer and second silane-containing layer may be formed from organosilane materials having at least one unsaturated bond capable of free radical polymerization. Systems and methods for making the disclosed integrated circuits are also provided.
Public/Granted literature
- US20050218481A1 COMPOSITE POLYMER DIELECTRIC FILM Public/Granted day:2005-10-06
Information query
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