发明授权
US06963126B2 Semiconductor device with under-fill material below a surface of a semiconductor chip 有权
具有在半导体芯片的表面下方的填充不足的材料的半导体器件

Semiconductor device with under-fill material below a surface of a semiconductor chip
摘要:
AS conductive patterns 11A to 11D are formed burying in a insulating resin 10 and a conductive foil 20 is formed being half-etched, thickness of the device is made thin. As an electrode for radiation 11D is provided, a semiconductor device superior in radiation is provided.
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