Invention Grant
- Patent Title: Highly efficient compact capacitance coupled plasma reactor/generator and method
-
Application No.: US10418562Application Date: 2003-04-16
-
Publication No.: US06967007B2Publication Date: 2005-11-22
- Inventor: Kin-Chung Ray Chiu
- Applicant: Kin-Chung Ray Chiu
- Applicant Address: US CA San Jose
- Assignee: Dryscrub, ETC.
- Current Assignee: Dryscrub, ETC.
- Current Assignee Address: US CA San Jose
- Agency: Townsend and Townsend and Crew LLP
- Main IPC: H05H1/24
- IPC: H05H1/24 ; B01J19/08 ; H01J37/32 ; H01L21/3065

Abstract:
A compact capacitively coupled electrode structure for use in a gas plasma reactor/generator is disclosed. The electrode structure comprises a parallel plate type anode and cathode spaced to define a gas flow path or volume therebetween. A plurality of electrically conductive fin elements are interposed in the space between the anode and cathode. The fin elements substantially increase the ratio of electrode surface area to volume, and subdivide the gas flow path or volume, thereby substantially increasing the efficiency of plasma gas processing that is possible over a broad range of operating parameters, without substantially increasing the spacing between the anode and cathode. Static or closed operation is also disclosed. Also disclosed is a multi-anode/multi-cathode electrode assembly embodying the basic electrode structure and a highly efficient and compact gas plasma reactor/generator employing the assembly.
Public/Granted literature
- US20050100487A1 Highly efficient compact capacitance coupled plasma reactor/generator and method Public/Granted day:2005-05-12
Information query
IPC分类: