- 专利标题: Real-time in-line testing of semiconductor wafers
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申请号: US10402804申请日: 2003-03-28
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公开(公告)号: US06967490B1公开(公告)日: 2005-11-22
- 发明人: Emil Kamieniecki , Jerzy Ruzyllo
- 申请人: Emil Kamieniecki , Jerzy Ruzyllo
- 申请人地址: US MA Billerica
- 专利权人: QC Solutions, Inc.
- 当前专利权人: QC Solutions, Inc.
- 当前专利权人地址: US MA Billerica
- 代理机构: Testa, Hurwitz & Thibeault, LLP
- 主分类号: H01L21/66
- IPC分类号: H01L21/66 ; G01R31/302
摘要:
An apparatus and method for the real-time, in-line testing of semiconductor wafers during the manufacturing process. In one embodiment the apparatus includes a probe assembly within a semiconductor wafer processing line. As each wafer passes adjacent the probe assembly, a source of modulated light, within the probe assembly, having a predetermined wavelength and frequency of modulation, impinges upon the wafer. A sensor in the probe assembly measures the surface photovoltage induced by the modulated light. A computer then uses the induced surface photovoltage to determine various electrical characteristics of the wafer.
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