发明授权
- 专利标题: Investigation device and investigation method
- 专利标题(中): 调查手段及调查方法
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申请号: US09886976申请日: 2001-06-25
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公开(公告)号: US06968079B2公开(公告)日: 2005-11-22
- 发明人: Akira Yoshikawa , Kazuhisa Machida , Hitoshi Komuro , Takehiro Hirai , Katsuhiro Kitahashi
- 申请人: Akira Yoshikawa , Kazuhisa Machida , Hitoshi Komuro , Takehiro Hirai , Katsuhiro Kitahashi
- 申请人地址: JP Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JP Tokyo
- 代理机构: Mattingly, Stanger, Malur & Brundidge, P.C.
- 优先权: JP2000-195128 20000628
- 主分类号: G01N21/956
- IPC分类号: G01N21/956 ; G06T1/00 ; G06T7/00 ; G06T7/60 ; H01L21/66 ; G06K9/00
摘要:
The present invention relates to an inspection device and inspection method of a specimen, particularly to the inspection device and inspection method of defects of semiconductor wafers, and the object is to cope with the increase of inspection images and provide an inspection device and inspection method which is capable of classification by sub class, meeting the user needs, in addition to the automatic classification by an inspection device.To achieve the afore-mentioned object, the present invention provides an inspection device, comprising a storage means for storing the images obtained and a display means equipped with the first display area for displaying multiple images stored in the storage means and the second display area for displaying the images which are classified according to the characteristics of the displayed images (called the classified images), wherein the display means displays the class of the specimen, displays the sub class which is set manually for each class, and also displays the images selected by the sub class as a mass of the classified images for each sub class.
公开/授权文献
- US20020001404A1 Investigation device and investigation method 公开/授权日:2002-01-03
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