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公开(公告)号：US06968079B2
公开(公告)日：2005-11-22
申请号：US09886976
申请日：2001-06-25
CPC分类号： G06T7/001 , G06T7/0002 , G06T7/60 , G06T2200/24 , G06T2207/30148
摘要： The present invention relates to an inspection device and inspection method of a specimen, particularly to the inspection device and inspection method of defects of semiconductor wafers, and the object is to cope with the increase of inspection images and provide an inspection device and inspection method which is capable of classification by sub class, meeting the user needs, in addition to the automatic classification by an inspection device.To achieve the afore-mentioned object, the present invention provides an inspection device, comprising a storage means for storing the images obtained and a display means equipped with the first display area for displaying multiple images stored in the storage means and the second display area for displaying the images which are classified according to the characteristics of the displayed images (called the classified images), wherein the display means displays the class of the specimen, displays the sub class which is set manually for each class, and also displays the images selected by the sub class as a mass of the classified images for each sub class.
摘要翻译： 本发明涉及一种试样的检查装置和检查方法，特别涉及检查装置和半导体晶片的缺陷检查方法，其目的是应对检查图像的增加，并提供检查装置和检查方法， 能够通过子类进行分类，满足用户需求，除了通过检查设备进行自动分类。 为了实现上述目的，本发明提供了一种检查装置，包括：存储装置，用于存储所获得的图像;以及显示装置，配备有用于显示存储在存储装置中的多个图像的第一显示区域和第二显示区域， 显示根据显示图像的特性（称为分类图像）分类的图像，其中显示装置显示样本的类别，显示为每个类别手动设置的子类，并且还显示所选择的图像 通过子类作为每个子类的分类图像的质量。
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公开(公告)号：US20110139982A1
公开(公告)日：2011-06-16
申请号：US13059601
申请日：2009-09-16
IPC分类号： G01N23/225
CPC分类号： G03F7/70466 , B82Y10/00 , G01B15/00 , H01J37/265 , H01J37/28 , H01J2237/221 , H01J2237/2817 , H01L22/12
摘要： An object of the present invention is to provide a method that can properly carry out the evaluation of a displacement and an overlapping area between first and second patterns formed through double patterning and a device therefor.To accomplish the above object, a method and a device are provided that execute a two-step matching between combined information having information concerning the first pattern combined with design information of the second pattern formed through a second exposure of double patterning and images displaying the first and second patterns, and on the basis of a moving amount of the design information of the second pattern, a displacement amount between the first and second patterns is determined.
摘要翻译： 本发明的目的是提供一种可以适当地进行通过双重图案形成的第一和第二图案之间的位移和重叠区域的评估的方法及其装置。 为了实现上述目的，提供了一种方法和装置，其执行具有与通过双重图案化的第二曝光形成的第二图案的设计信息相组合的第一图案的信息的组合信息和显示第一图像的图像之间的两步匹配 和第二图案，并且基于第二图案的设计信息的移动量，确定第一图案和第二图案之间的位移量。
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3.发明授权公开(公告)号：US07925095B2
公开(公告)日：2011-04-12
申请号：US11698988
申请日：2007-01-29
IPC分类号： G06K9/32
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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公开(公告)号：US07493074B2
公开(公告)日：2009-02-17
申请号：US11189735
申请日：2005-07-27
申请人： Hitoshi Komuro
发明人： Hitoshi Komuro
IPC分类号： G03G15/20
CPC分类号： G03G15/206 , G03G2215/2009 , G03G2215/2016 , G03G2215/2022
摘要： The present invention provides a fixing device that has a planar member including a heat conduction layer. The heat conduction layer has a predetermined thickness and relatively pressed against a rotary member being rotated so that the device fixes an unfixed toner image born by a recording sheet onto the recording sheet by causing the sheet bearing the unfixed toner image to pass between the planar member and the rotary member and applying heat and pressure to the unfixed toner image. The device includes a heater that applies heat to the unfixed toner image born by the sheet passing between the planar member and rotary member. The heat conduction layer includes a heat conduction anisotropic material whose heat conduction coefficient showing the degree of easiness of heat conduction in a surface direction in which the heat conduction layer extends is larger than that in a thickness direction.
摘要翻译： 本发明提供一种具有包括导热层的平面构件的固定装置。 导热层具有预定的厚度并相对地压靠旋转的旋转构件，使得装置通过使承载未定影调色剂图像的片材在平面构件之间通过，将由记录片材承载的未定影调色剂图像定影到记录片材上 和旋转构件，并且对未定影的调色剂图像施加热和压力。 该装置包括加热器，该加热器对通过平面构件和旋转构件之间的片材所承载的未定影调色剂图像施加热量。 导热层包括导热各向异性材料，其导热系数表示在导热层延伸的表面方向上的热传导的容易程度大于厚度方向上的热传导系数。
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公开(公告)号：US20060193508A1
公开(公告)日：2006-08-31
申请号：US11359374
申请日：2006-02-23
IPC分类号： G06K9/00
CPC分类号： H01J37/265 , H01J37/28 , H01J2237/2817
摘要： A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
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公开(公告)号：US06384909B2
公开(公告)日：2002-05-07
申请号：US09842929
申请日：2001-04-27
申请人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
发明人： Koji Tomita , Muneo Maeshima , Shigeru Matsui , Yoshitaka Kodama , Hitoshi Komuro , Kazuo Takeda
IPC分类号： G01N2188
CPC分类号： G01N21/9505 , G01N21/9501
摘要： A defect inspection apparatus for detecting defects existing on a surface of a semiconductor sample and/or inside the sample based on light information from the sample obtained by irradiating a light beam onto the sample is provided, which comprises a detecting means for detecting positions in the depth direction where the defects exist and distribution of the defects based on the light information; a setting means for setting a position in the depth direction where defects exist; and a means for displaying the distribution of the defects obtained by the detecting means, the displaying means displaying the distribution of the defects corresponding to the position in the depth direction set by the setting means.
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7.发明申请公开(公告)号：US20110150345A1
公开(公告)日：2011-06-23
申请号：US13034237
申请日：2011-02-24
IPC分类号： G06K9/62
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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8.发明申请公开(公告)号：US20080037830A1
公开(公告)日：2008-02-14
申请号：US11698988
申请日：2007-01-29
IPC分类号： G06K9/00
CPC分类号： G06K9/6204 , G06K9/4633
摘要： A pattern matching method which is capable of selecting a suitable measurement object pattern, even on a sample containing a periodic structure, and a computer program for making a computer execute the pattern matching. In a pattern matching method which executes matching between the design data-based first image of an object sample, and a second image, whether or not a periodic structure is included in a region to execute the matching is determined, so as to select a pattern, based on distance between an original point which is set in said image, and the pattern configuring said periodic structure, in the case where the periodic structure is included in said region, and to select a pattern based on coincidence of the pattern in said image, in the case where the periodic structure is not included in said region, and a computer program product.
摘要翻译： 能够选择合适的测量对象图案的模式匹配方法，即使在包含周期性结构的样本上，也可以使计算机程序使计算机执行模式匹配。 在执行对象样本的基于设计数据的第一图像与第二图像之间的匹配的图案匹配方法中，确定在区域中是否包括周期性结构以执行匹配，以便选择图案 基于在所述图像中设置的原始点与构成所述周期性结构的图案之间的距离，在所述区域中包括周期性结构的情况下，以及基于所述图像中的图案的一致性来选择图案 在周期性结构不包括在所述区域中的情况下，以及计算机程序产品。
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公开(公告)号：US20070223803A1
公开(公告)日：2007-09-27
申请号：US11723577
申请日：2007-03-21
IPC分类号： G06K9/00
CPC分类号： G06K9/2036 , G06T7/0006 , G06T2207/10056 , G06T2207/30148 , H01J2237/221 , H01J2237/24592
摘要： It is an object of the invention to provide a suitable method for identifying depression/protrusion information in a design data; and a program and an apparatus for the same; for example, even in the case that similar portions are arranged, to provide a method for enabling a pattern matching with high precision between the design data and an image obtained by an image formation apparatus or the like; and a program and an apparatus for the same. To attain the above object, a pattern matching method, wherein, using information concerning a depression and/or a protrusion of the pattern on the design data, or a pattern portion and/or a non-pattern portion on the design data, pattern matching is executed between the pattern on the design data and the pattern on said image; and a program for the same are provided.
摘要翻译： 本发明的目的是提供一种用于在设计数据中识别抑郁/突出信息的合适方法; 以及用于其的程序和装置; 例如，即使在配置相似部分的情况下，也可以提供一种能够在设计数据和由图像形成装置等获得的图像之间实现高精度的图案匹配的方法; 以及用于其的程序和装置。 为了实现上述目的，提供了一种图案匹配方法，其中使用关于设计数据上的图案的凹陷和/或突出的信息，或者设计数据上的图案部分和/或非图案部分的图案匹配 在设计数据上的图案和所述图像上的图案之间执行; 并提供其程序。
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公开(公告)号：US5314078A
公开(公告)日：1994-05-24
申请号：US941893
申请日：1992-09-08
申请人： Akira Morikiyo , Toshio Kanbe , Shuichi Shinbo , Shigeru Yoshikawa , Yoshikazu Shimodaira , Kazuya Ohminami , Hitoshi Komuro
发明人： Akira Morikiyo , Toshio Kanbe , Shuichi Shinbo , Shigeru Yoshikawa , Yoshikazu Shimodaira , Kazuya Ohminami , Hitoshi Komuro
CPC分类号： A47F1/087
摘要： An article storage rack apparatus for storing and dispensing articles in first-in, first-out order comprises side-by-side columns of slant racks, in which alternate slant racks in each column are inclined downwardly in opposite direction. Articles are introduced onto the topmost slant rack and slide downward by gravity to successively lower slant racks. The articles are transferred from a slant rack to the next lower slant rack by a transfer mechanism comprising tables which are movable vertically and tiltable. The articles are maintained in the same orientation as they slide down the array of slant racks. At the lower end of the bottom slant rack, the articles are dispensed, by a tilting table dispenser, in the same order in which they were introduced onto the top slant rack.
摘要翻译： 用于以先进先出的顺序存储和分配物品的物品存放架设备包括倾斜架的并排列，其中每列中的交替的倾斜架在相反的方向上向下倾斜。 将物品引入最上面的倾斜架上，并通过重力向下滑动，以连续降低斜架。 物品通过包括可垂直移动和可倾斜移动的桌子的传送机构从倾斜架转移到下一个下倾斜架。 这些物品沿着倾斜的货架阵列滑下的方向保持相同的方向。 在底部倾斜架的下端，物品通过倾斜台式分配器按照它们被引入到顶部倾斜架上的顺序被分配。
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