发明授权
- 专利标题: Method and apparatus for making devices
- 专利标题(中): 制造装置的方法和装置
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申请号: US10197462申请日: 2002-07-18
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公开(公告)号: US06973710B2公开(公告)日: 2005-12-13
- 发明人: Hiroshi Kiguchi , Masahiro Furusawa , Hirotsuna Miura
- 申请人: Hiroshi Kiguchi , Masahiro Furusawa , Hirotsuna Miura
- 申请人地址: JP Tokyo
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2001-236369 20010803
- 主分类号: H01Q1/22
- IPC分类号: H01Q1/22 ; H05K1/16 ; H05K3/12 ; H05K3/40 ; H01Q17/00
摘要:
A method and an apparatus for manufacturing a device are provided. The method and the apparatus can form micro wiring without undesired wetting and spreading using an inexpensive functional-liquid supplying method. A method for forming a device, such as a radiofrequency identification tag, includes: making patterns at a plurality of sections having different degrees of affinity to the functional liquid on a substrate to form the device; and supplying the functional liquid to the selected section having high affinity to the functional liquid. Forming the plurality of sections having different degrees of affinity to the functional liquid includes, for example: supplying an organosiloxane film on the substrate, and exposing the organosiloxane film through an optical mask.
公开/授权文献
- US20030024103A1 Method and apparatus for making devices 公开/授权日:2003-02-06