Invention Grant
- Patent Title: Sintered silicon nitride
- Patent Title (中): 烧结氮化硅
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Application No.: US10621168Application Date: 2003-07-15
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Publication No.: US06977233B2Publication Date: 2005-12-20
- Inventor: Chien-Wei Li , Bjoern Schenk , James V. Guiheen
- Applicant: Chien-Wei Li , Bjoern Schenk , James V. Guiheen
- Applicant Address: US NJ Morristown
- Assignee: Honeywell International, Inc.
- Current Assignee: Honeywell International, Inc.
- Current Assignee Address: US NJ Morristown
- Agency: Ingrassia Fisher & Lorenz
- Main IPC: C04B35/593
- IPC: C04B35/593 ; F01D5/28 ; C04B35/577 ; C04B35/596

Abstract:
Sintered silicon nitride products comprising predominantly β-silicon nitride grains in combination with from about 0.1 to 30 mole % silicon carbide, and grain boundary secondary phases of scandium oxide and scandium disilicate. Such products have high fracture toughness, resistance to recession, and resistance to oxidation at temperatures of at least 1500° C. Methods for preparing sintered silicon nitride products are also disclosed.
Public/Granted literature
- US20050014629A1 Sintered silicon nitride Public/Granted day:2005-01-20
Information query
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