发明授权
- 专利标题： Method and device for determining projection lens pupil transmission distribution and illumination intensity distribution in photolithographic imaging system
- 专利标题（中）： 用于确定光刻成像系统中的投影透镜光瞳透射分布和照明强度分布的方法和装置
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申请号： US10727385申请日： 2003-12-04
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公开(公告)号： US06977717B1公开(公告)日： 2005-12-20
- 发明人: Ivan Lalovic , Bruno M. LaFontaine , Jongwook Kye
- 申请人： Ivan Lalovic , Bruno M. LaFontaine , Jongwook Kye
- 申请人地址： US CA Sunnyvale
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Renner, Otto, Boisselle & Sklar, LLP
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/54 ; G03F7/20
摘要：
A method and device for determining projection lens pupil transmission distribution in a photolithographic imaging system, the device including an illumination source; a transmissive reticle; an aperture layer having an illumination source side and a light emission side and comprising a plurality of openings therethrough; a diffuser mounted on the illumination source side of the aperture layer; a projection lens system; and an image plane, in which a pupil image corresponding to each of the plurality of openings in the aperture layer is formed at the image plane when radiation from the illumination source passes through the reticle, the diffuser, the aperture layer and the projection lens system, the pupil image having a projection lens pupil transmission distribution.