Invention Grant
US06985387B2 System and method for one-time programmed memory through direct-tunneling oxide breakdown
失效
通过直接隧道氧化物分解的一次编程存储器的系统和方法
- Patent Title: System and method for one-time programmed memory through direct-tunneling oxide breakdown
- Patent Title (中): 通过直接隧道氧化物分解的一次编程存储器的系统和方法
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Application No.: US10849295Application Date: 2004-05-20
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Publication No.: US06985387B2Publication Date: 2006-01-10
- Inventor: Vincent Chen , Henry Chen , Liming Tsau , Jay Shiau , Surya Battacharya , Akira Ito
- Applicant: Vincent Chen , Henry Chen , Liming Tsau , Jay Shiau , Surya Battacharya , Akira Ito
- Applicant Address: US CA Irvine
- Assignee: Broadcom Corporation
- Current Assignee: Broadcom Corporation
- Current Assignee Address: US CA Irvine
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G11C7/00
- IPC: G11C7/00 ; H01L29/00

Abstract:
A one-time programming memory element, capable of being manufactured in a 0.13 μm or below CMOS technology, having a capacitor, or transistor configured as a capacitor, with an oxide layer capable of passing direct gate tunneling current. Also included is a write circuit, having first and second switches coupled to the capacitor, and a read circuit also coupled to the capacitor. The capacitor/transistor is one-time programmable as an anti-fuse by application of a program voltage across the oxide layer via the write circuit to cause direct gate tunneling current to rupture the oxide layer to form a conductive path having resistance of approximately hundreds of ohms or less.
Public/Granted literature
- US20040212037A1 System and method for one-time programmed memory through direct-tunneling oxide breakdown Public/Granted day:2004-10-28
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