- 专利标题: Semiconductor laser and method for manufacturing the same
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申请号: US10368206申请日: 2003-02-18
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公开(公告)号: US06985504B2公开(公告)日: 2006-01-10
- 发明人: Tetsuo Ueda , Keiji Yamane , Isao Kidoguchi , Shoji Fujimori
- 申请人: Tetsuo Ueda , Keiji Yamane , Isao Kidoguchi , Shoji Fujimori
- 申请人地址: JP Osaka
- 专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人: Matsushita Electric Industrial Co., Ltd.
- 当前专利权人地址: JP Osaka
- 代理机构: Hamre, Schumann, Mueller & Larson, P.C.
- 优先权: JP2002-042091 20020219
- 主分类号: H01S5/00
- IPC分类号: H01S5/00
摘要:
A semiconductor laser includes an active layer formed on a substrate and a pair of cladding layers sandwiching the active layer. On at least one of resonator end faces of the semiconductor laser, a first dielectric film with hydrogen added therein is provided. Between the first dielectric film and the resonator end face, a second dielectric film for suppressing the diffusion of hydrogen is provided. Even when a semiconductor laser with an end face coating film including a hydrogen-added film is exposed to high temperatures, peeling of the end face coating film and deterioration of the end face coating film can be suppressed.
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