发明授权
- 专利标题: Light source device and exposure equipment using the same
- 专利标题(中): 光源设备和曝光设备使用相同
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申请号: US11014961申请日: 2004-12-20
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公开(公告)号: US06987279B2公开(公告)日: 2006-01-17
- 发明人: Hideo Hoshino , Hiroshi Komori , Akira Endo
- 申请人: Hideo Hoshino , Hiroshi Komori , Akira Endo
- 申请人地址: JP Tokyo JP Tokyo
- 专利权人: Komatsu Ltd.,Gigaphoton Inc.
- 当前专利权人: Komatsu Ltd.,Gigaphoton Inc.
- 当前专利权人地址: JP Tokyo JP Tokyo
- 代理机构: Wenderoth, Lind & Ponack, L.L.P.
- 优先权: JP2004-002142 20040107
- 主分类号: G01J1/00
- IPC分类号: G01J1/00 ; H01J17/26 ; H01J35/00 ; B06B6/00
摘要:
A light source device capable of extending the life of a collector mirror and reducing running cost by protecting the collector mirror from debris that is considered harmful to a mirror coating while securing the collection solid angle and collection rate of EUV light. The light source device includes a target supply unit for supplying a material to become the target; a laser unit for generating plasma by applying a laser beam to the target; a collection optical system for collecting the extreme ultra violet light radiating from the plasma and emitting the extreme ultra violet light; and magnetic field generating unit for generating a magnetic field within the collection optical system when supplied with current so as to trap charged particles radiating from the plasma.
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