Invention Grant
- Patent Title: Water-developable photosensitive resin for flexography
- Patent Title (中): 用于柔版印刷的水显影感光树脂
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Application No.: US10432930Application Date: 2001-11-27
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Publication No.: US06989226B2Publication Date: 2006-01-24
- Inventor: Yoshifumi Araki , Hiromi Kobayashi
- Applicant: Yoshifumi Araki , Hiromi Kobayashi
- Applicant Address: JP Tokyo
- Assignee: Asahi Kasei Chemicals Corporation
- Current Assignee: Asahi Kasei Chemicals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2000-361371 20001128; JP2001-111193 20010410
- International Application: PCT/JP01/10336 WO 20011127
- International Announcement: WO02/44813 WO 20020606
- Main IPC: G03F7/033
- IPC: G03F7/033

Abstract:
An object of the present invention is to provide a photosensitive resin composition which is excellent in the compatibility (dispersibility) of photosensitive resin composition components, developability with aqueous developer solution, water resistance, image reproducibility, print wear characteristics in printing with a water base ink and plate wiping-off resistance in removal of ink adhered to any printing plate. The present invention relates to a photosensitive resin composition comprising a hydrophilic copolymer (A) obtained by copolymerizing at least (1) 2 to 15 parts by mass of an unsaturated monomer having a carboxyl group, (2) 50 to 80 parts by mass of a conjugated diene-type monomer, (3) 3 to 20 parts by mass of an aromatic vinyl compound, and (4) 3 to 30 parts by mass of an alkyl (meth)acrylate.
Public/Granted literature
- US20040067442A1 Water-developable photosensitive resin for flexography Public/Granted day:2004-04-08
Information query
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