Invention Grant
- Patent Title: Measuring an alignment target with a single polarization state
- Patent Title (中): 用单极化状态测量对准目标
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Application No.: US10261547Application Date: 2002-09-30
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Publication No.: US06992764B1Publication Date: 2006-01-31
- Inventor: Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello , John D. Heaton
- Applicant: Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello , John D. Heaton
- Applicant Address: US CA Milpitas
- Assignee: Nanometrics Incorporated
- Current Assignee: Nanometrics Incorporated
- Current Assignee Address: US CA Milpitas
- Agency: Silicon Valley Patent Group LLP
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns with an incident beam having a single polarization state and detecting the intensity of the resulting polarized light, it can be determined if the two elements are aligned. The same polarization state may be detected as is incident or different polarization states may be used. A reference measurement location may be used that includes a third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is similarly measured with a single polarization state.
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