发明授权
- 专利标题: Measuring an alignment target with a single polarization state
- 专利标题(中): 用单极化状态测量对准目标
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申请号: US10261547申请日: 2002-09-30
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公开(公告)号: US06992764B1公开(公告)日: 2006-01-31
- 发明人: Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello , John D. Heaton
- 申请人: Weidong Yang , Roger R. Lowe-Webb , Silvio J. Rabello , John D. Heaton
- 申请人地址: US CA Milpitas
- 专利权人: Nanometrics Incorporated
- 当前专利权人: Nanometrics Incorporated
- 当前专利权人地址: US CA Milpitas
- 代理机构: Silicon Valley Patent Group LLP
- 主分类号: G01J4/00
- IPC分类号: G01J4/00
摘要:
An alignment target includes periodic patterns on two elements. The periodic patterns are aligned when the two elements are properly aligned. By measuring the two periodic patterns with an incident beam having a single polarization state and detecting the intensity of the resulting polarized light, it can be determined if the two elements are aligned. The same polarization state may be detected as is incident or different polarization states may be used. A reference measurement location may be used that includes a third periodic pattern on the first element and a fourth periodic pattern on the second element, which have a designed in offset, i.e., an offset when there is an offset of a known magnitude when the first and second element are properly aligned. The reference measurement location is similarly measured with a single polarization state.
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