发明授权
US07011910B2 Halftone-type phase-shift mask blank, and halftone-type phase-shift mask
有权
半色调型相移掩模空白和半色调型相移掩模
- 专利标题: Halftone-type phase-shift mask blank, and halftone-type phase-shift mask
- 专利标题(中): 半色调型相移掩模空白和半色调型相移掩模
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申请号: US10421944申请日: 2003-04-24
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公开(公告)号: US07011910B2公开(公告)日: 2006-03-14
- 发明人: Yuki Shiota , Osamu Nozawa , Hideaki Mitsui , Ryo Ohkubo
- 申请人: Yuki Shiota , Osamu Nozawa , Hideaki Mitsui , Ryo Ohkubo
- 申请人地址: JP Tokyo
- 专利权人: Hoya Corporation
- 当前专利权人: Hoya Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2002-127445 20020426; JP2002-127454 20020426; JP2002-127468 20020426; JP2002-127470 20020426
- 主分类号: G01F9/00
- IPC分类号: G01F9/00
摘要:
In a halftone-type phase-shift mask blank having a phase shifter film 5, the phase shifter film 5 has a phase adjustment layer 4 for primarily controlling the phase of exposure light, and a transmissivity adjustment layer 3 which is formed between a transparent substrate 2 and the phase adjustment layer 4 and primarily controls the transmissivity of exposure light. The transmissivity adjustment layer 3 has a thickness of 90 angstroms or less.
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