- 专利标题: Nitride semiconductor laser device
-
申请号: US10700270申请日: 2003-11-04
-
公开(公告)号: US07015053B2公开(公告)日: 2006-03-21
- 发明人: Tokuya Kozaki , Masahiko Sano , Shuji Nakamura , Shinichi Nagahama
- 申请人: Tokuya Kozaki , Masahiko Sano , Shuji Nakamura , Shinichi Nagahama
- 申请人地址: JP Tokushima
- 专利权人: Nichia Corporation
- 当前专利权人: Nichia Corporation
- 当前专利权人地址: JP Tokushima
- 代理机构: Nixon & Vanderhye P.C.
- 优先权: JPP11-057211 19990304; JPP11-157646 19990604; JPP11-163499 19990610; JPP11-163500 19990610
- 主分类号: H01L21/00
- IPC分类号: H01L21/00
摘要:
A nitride semiconductor laser device has an improved stability of the lateral mode under high output power and a longer lifetime, so that the device can be applied to write and read light sources for recording media with high capacity. The nitride semiconductor laser device includes an active layer, a p-side cladding layer, and a p-side contact layer laminated in turn. The device further includes a waveguide region of a stripe structure formed by etching from the p-side contact layer. The stripe width provided by etching is within the stripe range of 1 to 3 μm and the etching depth is below the thickness of the p-side cladding layer of 0.1 μm and above the active layer. Particularly, when a p-side optical waveguide layer includes a projection part of the stripe structure and a p-type nitride semiconductor layer on the projection part and the projection part of the p-side optical waveguide layer has a thickness of not more than 1 μm, an aspect ratio is improved in far field image. Moreover, the thickness of the p-side optical waveguide layer is greater than that of an n-side optical waveguide layer.
公开/授权文献
- US20040101986A1 Nitride semiconductor laser device 公开/授权日:2004-05-27
信息查询
IPC分类: