Invention Grant
US07015102B2 Method of forming floating-gate memory cell having trench structure with ballistic-charge injector, and the array of memory cells made thereby 失效
用弹道电荷注入器形成具有沟槽结构的浮栅存储单元的方法,以及由此形成的存储单元阵列

  • Patent Title: Method of forming floating-gate memory cell having trench structure with ballistic-charge injector, and the array of memory cells made thereby
  • Patent Title (中): 用弹道电荷注入器形成具有沟槽结构的浮栅存储单元的方法,以及由此形成的存储单元阵列
  • Application No.: US11006237
    Application Date: 2005-04-13
  • Publication No.: US07015102B2
    Publication Date: 2006-03-21
  • Inventor: Chih-Hsin Wang
  • Applicant: Chih-Hsin Wang
  • Main IPC: H10L21/336
  • IPC: H10L21/336
Method of forming floating-gate memory cell having trench structure with ballistic-charge injector, and the array of memory cells made thereby
Abstract:
A method of forming an array of floating gate memory cells, and an array formed thereby, wherein each memory cell includes an electrical conductive floating gate formed in a trench in a semiconductor substrate, and an electrical conductive control gate having a portion disposed over and insulated from the floating gate. An electrical conductive tunneling gate is disposed over and insulated from the control gate by an insulating layer to form a tri-layer structure permitting both electron and hole charges tunneling through at similar tunneling rate. Spaced apart source and drain regions are formed with the source region disposed adjacent to and insulated from a lower portion of the floating gate, and with the drain region disposed adjacent to and insulated from an upper portion of the floating gate with a channel region formed therebetween and along a sidewall of the trench.
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