发明授权
- 专利标题： Use of amorphous carbon for gate patterning
- 专利标题（中）： 无定形碳用于栅极图案化
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申请号： US10424420申请日： 2003-04-28
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公开(公告)号： US07015124B1公开(公告)日： 2006-03-21
- 发明人: Philip A. Fisher , Richard J. Huang , Cyrus E. Tabery
- 申请人： Philip A. Fisher , Richard J. Huang , Cyrus E. Tabery
- 申请人地址： US CA Sunnyvale
- 专利权人： Advanced Micro Devices, Inc.
- 当前专利权人： Advanced Micro Devices, Inc.
- 当前专利权人地址： US CA Sunnyvale
- 代理机构： Foley & Lardner LLP
- 主分类号： H01L21/3205
- IPC分类号： H01L21/3205 ; H01L21/4763
摘要：
A method of producing an integrated circuit includes providing a mask definition structure above a layer of conductive material and providing a mask above the layer of conductive material and in contact with at least a portion of the mask definition structure. The mask definition structure comprises a first material and the mask comprises a second material, wherein at least one of the first and second materials comprises amorphous carbon. The mask definition structure is removed, and the layer of conductive material is patterned according to the mask.
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