发明授权
- 专利标题： Selective salicidation methods
- 专利标题（中）： 选择性盐化方法
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申请号： US10710131申请日： 2004-06-21
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公开(公告)号： US07015140B2公开(公告)日： 2006-03-21
- 发明人: Russell H. Arndt , Kenneth J. Giewont , Kevin E. Mello , M. Dean Sciacca
- 申请人： Russell H. Arndt , Kenneth J. Giewont , Kevin E. Mello , M. Dean Sciacca
- 申请人地址： US NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： US NY Armonk
- 代理机构： Hoffman, Warnick & D'Alessandro LLC
- 代理商 Lisa U. Jaklitsch
- 主分类号： H01L21/44
- IPC分类号： H01L21/44 ; H01L21/4763
摘要：
Methods for selective salicidation of a semiconductor device. The invention implements a chemical surface pretreatment by immersion in ozonated water H2O prior to metal deposition. The pretreatment forms an interfacial layer that prevents salicidation over an n-type structure. As a result, the invention does not add any additional process steps to the conventional salicidation processing.
公开/授权文献
- US20050282370A1 SELECTIVE SALICIDATION METHODS 公开/授权日：2005-12-22
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