Invention Grant
- Patent Title: Cantilever sensor and fabrication method thereof
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Application No.: US10448188Application Date: 2003-05-30
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Publication No.: US07022540B2Publication Date: 2006-04-04
- Inventor: Tae Song Kim , Hyung Joon Kim , Jeong Hoon Lee , Ji Yoon Kang
- Applicant: Tae Song Kim , Hyung Joon Kim , Jeong Hoon Lee , Ji Yoon Kang
- Applicant Address: KR Seoul
- Assignee: Korea Institute of Science and Technology
- Current Assignee: Korea Institute of Science and Technology
- Current Assignee Address: KR Seoul
- Agency: McDermott Will & Emery LLP
- Priority: KR10-2002-0030340 20020530
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
In a cantilever sensor and a fabrication thereof, by forming piezoelectric films on the same surface, it is possible to sense various information by an electric measuring method. The cantilever sensor comprises a first silicon nitride film formed onto the top surface of a silicon substrate; a silicon oxide film formed onto the first silicon nitride film; a lower electrode formed onto the silicon oxide film; a first piezoelectric film and a second piezoelectric film formed onto the lower electrode, the second piezoelectric film formed out of contact with the first piezoelectric film; an upper electrode respectively formed onto the first and second piezoelectric films; a protecting film formed onto the silicon oxide film, the lower electrode, the first and second piezoelectric films and the upper electrode; a first and a second openings respectively formed on the protecting film on the upper electrode and the protecting film on the lower electrode; a first and a second contact pads respectively formed at the first and second openings; a T-shaped sensing portion formed at the end of a cantilever; a second silicon nitride film formed on the bottom surface of the silicon substrate.
Public/Granted literature
- US20030224551A1 Cantilever sensor and fabrication method thereof Public/Granted day:2003-12-04
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