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US07026261B2 Method for fabricating semiconductor device 有权
制造半导体器件的方法

Method for fabricating semiconductor device
摘要:
A semiconductor layer formed on one surface of a substrate is irradiated with light from the other surface of the substrate to thermally decompose part of a region of the semiconductor layer in contact with the substrate, thereby forming a thermally decomposed layer. Thereafter, the thermally decomposed layer is removed with the substrate kept bonded with the semiconductor layer.
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