发明授权
- 专利标题: Field effect transistor with a high breakdown voltage and method of manufacturing the same
- 专利标题(中): 具有高击穿电压的场效应晶体管及其制造方法
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申请号: US10935890申请日: 2004-09-08
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公开(公告)号: US07033896B2公开(公告)日: 2006-04-25
- 发明人: Ji-Su Kim , Sung-Hoan Kim
- 申请人: Ji-Su Kim , Sung-Hoan Kim
- 申请人地址: KR
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR
- 代理机构: Mills & Onello LLP
- 优先权: KR10-2003-0065891 20030923
- 主分类号: H01L21/336
- IPC分类号: H01L21/336 ; H01L29/76
摘要:
An electric field effect transistor of high breakdown voltage and a method of manufacturing the same are disclosed. A recessed portion is formed at the channel region and is filled by a protective oxide layer. Lightly doped source/drain regions are formed under the protective oxide layer. The protective oxide layer protects the lightly doped source/drain regions. Accordingly, the protective oxide layer prevents the electric field from being concentrated to a bottom corner portion of the gate structure. In addition, the effective channel length is elongated since an electric power source is connected to heavily doped source/drain regions from an outside source of the transistor, instead of being connected to lightly doped source/drain regions.
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