发明授权
- 专利标题: Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
- 专利标题(中): 辐射系统,污染屏障,光刻设备,器件制造方法和由此制造的器件
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申请号: US10873646申请日: 2004-06-23
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公开(公告)号: US07034308B2公开(公告)日: 2006-04-25
- 发明人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Ralph Kurt , Frank Jeroen Pieter Schuurmans , Yurii Victorovitch Sidelnikov
- 申请人: Levinus Pieter Bakker , Vadim Yevgenyevich Banine , Ralph Kurt , Frank Jeroen Pieter Schuurmans , Yurii Victorovitch Sidelnikov
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Pillsbury Winthrop Shaw Pittman, LLP
- 优先权: EP03077012 20030627
- 主分类号: G21G5/00
- IPC分类号: G21G5/00 ; G03F7/20 ; G03B27/52
摘要:
A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G21 | 核物理;核工程 |
G21G | 化学元素的转变;放射源 |
G21G5/00 | 通过化学反应进行化学元素的推断转变 |