发明授权
US07034308B2 Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby 失效
辐射系统,污染屏障,光刻设备,器件制造方法和由此制造的器件

Radiation system, contamination barrier, lithographic apparatus, device manufacturing method and device manufactured thereby
摘要:
A radiation system includes a contamination barrier, e.g., a foil trap, between a collector, for example a normal incidence collector, and a radiation source, such that radiation coming from the source passes the foil trap twice. The radiation passes the contamination barrier once before hitting the collector and a second time after reflection by the collector. The foil trap includes lamellas that are parallel to both the radiation coming from the light source, and to the radiation reflected by the collector. The radiation is thus not obstructed by the foil trap. In this way, a normal incidence collector, which is used with a plasma produced source, can be protected from debris coming from a EUV source.
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