发明授权
US07037573B2 Antireflection film, its production method, optical device, and image display
有权
防反射膜，其制造方法，光学装置和图像显示
- 专利标题： Antireflection film, its production method, optical device, and image display
- 专利标题（中）： 防反射膜，其制造方法，光学装置和图像显示
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申请号： US10507484申请日： 2003-03-12
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公开(公告)号： US07037573B2公开(公告)日： 2006-05-02
- 发明人: Minoru Miyatake , Masahiro Yoshioka , Tomoaki Masuda , Atsushi Kitagawa , Hiroyuki Takao , Kaori Shirouzu
- 申请人： Minoru Miyatake , Masahiro Yoshioka , Tomoaki Masuda , Atsushi Kitagawa , Hiroyuki Takao , Kaori Shirouzu
- 申请人地址： JP Ibaraki
- 专利权人： Nitto Denko Corporation
- 当前专利权人： Nitto Denko Corporation
- 当前专利权人地址： JP Ibaraki
- 代理机构： Westerman, Hattori, Daniels & Adrian LLP
- 优先权： JP2002-071448 20020315; JP2002-212750 20020722; JP2002-212751 20020722; JP2003-055268 20030303
- 国际申请： PCT/JP03/02890 WO 20030312
- 国际公布： WO03/079059 WO 20030925
- 主分类号： B32B3/00
- IPC分类号： B32B3/00 ; B32B9/04 ; B05D5/06
摘要：
An antireflection layer is formed directly or through an other layer at least on one side of a transparent base film of an antireflection film. The antireflection layer is made of at least two kinds of low refractive index materials satisfying a relationship of refractive index: nd20≦1.49. The antireflection layer is excellent in antireflection characteristics and mar resistance. When the antireflection layer is formed on a hard coat layer having an uneven surface roughened by particles, the antireflection film is excellent in antiglareness.