发明授权
US07040768B2 Light source unit, illumination optical device, projector, and method of manufacturing light source unit
失效
光源单元,照明光学装置,投影仪以及光源单元的制造方法
- 专利标题: Light source unit, illumination optical device, projector, and method of manufacturing light source unit
- 专利标题(中): 光源单元,照明光学装置,投影仪以及光源单元的制造方法
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申请号: US10849877申请日: 2004-05-21
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公开(公告)号: US07040768B2公开(公告)日: 2006-05-09
- 发明人: Shohei Fujisawa , Takeshi Takezawa , Hiroyuki Kobayashi
- 申请人: Shohei Fujisawa , Takeshi Takezawa , Hiroyuki Kobayashi
- 申请人地址: JP Tokyo
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Oliff & Berridge, PLC
- 优先权: JP2003-145116 20030522
- 主分类号: F21V7/00
- IPC分类号: F21V7/00
摘要:
Exemplary embodiments of the present invention include a light source unit in which lowering of an illumination intensity of an emitted luminous flux is reduced or prevented. A light source lamp unit includes a light source lamp having a light emitting section in which discharging emission is performed between electrodes, an elliptic reflector to emit a luminous flux radiated from the light source lamp in a certain uniform direction, and a secondary reflecting mirror provided on the opposite side of the light source lamp opposite from the elliptic reflector. A center of light emission C2 between the electrodes does not match a first focal point F1 of the elliptic reflector, a center of the source of reflected light C1 of the secondary reflecting mirror does not match the first focal point F1 of the elliptic reflector. The center of light emission C2, the first focal point F1, and the center of the source of reflected light C1 are disposed on a straight line perpendicular to a straight line connecting the first focal point F1 and a second focal point F2 of the elliptic reflector.