发明授权
- 专利标题: Exposure apparatus
- 专利标题(中): 曝光装置
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申请号: US11229829申请日: 2005-09-20
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公开(公告)号: US07046330B2公开(公告)日: 2006-05-16
- 发明人: Eiichi Murakami
- 申请人: Eiichi Murakami
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2000-093449 20000330
- 主分类号: G03B27/52
- IPC分类号: G03B27/52 ; G03B27/42
摘要:
An exposure apparatus for printing, by exposure, a pattern of an original onto a substrate includes a housing tightly filled with a predetermined ambience and for accommodating therein at least a portion of an exposure light optical axis, and a detection system having an optical system, wherein a portion of a light path of the detection system is disposed in a first space enclosed by the housing, and wherein at least another portion of the detection system including an electrical element thereof is disposed in a second space outside the housing.
公开/授权文献
- US20060007416A1 Exposure apparatus 公开/授权日:2006-01-12
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