发明授权
US07050175B1 Method for calibrating an interferometer apparatus, for qualifying an optical surface, and for manufacturing a substrate having an optical surface
有权
用于校准干涉仪装置的方法，用于限定光学表面，以及用于制造具有光学表面的基底
- 专利标题： Method for calibrating an interferometer apparatus, for qualifying an optical surface, and for manufacturing a substrate having an optical surface
- 专利标题（中）： 用于校准干涉仪装置的方法，用于限定光学表面，以及用于制造具有光学表面的基底
-
申请号： US10637217申请日： 2003-08-08
-
公开(公告)号： US07050175B1公开(公告)日： 2006-05-23
- 发明人: Rolf Freimann , Bernd Dörband
- 申请人： Rolf Freimann , Bernd Dörband
- 申请人地址： DE Oberkochen
- 专利权人： Carl Zeiss SMT AG
- 当前专利权人： Carl Zeiss SMT AG
- 当前专利权人地址： DE Oberkochen
- 代理机构： Townsend and Townsend and Crew LLP
- 主分类号： G01B9/02
- IPC分类号： G01B9/02
摘要：
A method for qualifying and/or manufacturing an optical surface includes: arranging a first substrate having a first surface and a second surface opposite the first surface in a beam path of a first incident beam with the first surface facing towards the first incident beam, and taking an interferometric measurement of the second surface; arranging the first substrate in the beam path of the first incident beam with the second surface facing towards the first incident beam, and taking an interferometric measurement of the second surface; arranging a third surface of a second substrate in a beam path of a second incident beam, and taking an interferometric measurement of the third surface; arranging the third surface of the second substrate and the first substrate in the beam path of the second incident beam, and taking an interferometric measurement of the third surface.