Invention Grant
US07052809B2 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same
有权
膜和掩模版防护薄膜组件,其使用相同的带有防护薄膜 - 标线间隙
- Patent Title: Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same
- Patent Title (中): 膜和掩模版防护薄膜组件,其使用相同的带有防护薄膜 - 标线间隙
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Application No.: US10677706Application Date: 2003-10-02
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Publication No.: US07052809B2Publication Date: 2006-05-30
- Inventor: Christopher J. Vroman , Nathan Abbott
- Applicant: Christopher J. Vroman , Nathan Abbott
- Applicant Address: US MA Billerica
- Assignee: Mykrolis Corporation
- Current Assignee: Mykrolis Corporation
- Current Assignee Address: US MA Billerica
- Agent Timothy J. King; John E. Pillion
- Main IPC: G03F1/14
- IPC: G03F1/14 ; G03B27/62 ; B01D46/00 ; B01D39/20 ; C22C38/08

Abstract:
A gas porous media which comprises a material having a low coefficient of thermal expansion that is capable of retaining 99.99% or more of particles of a size of about 0.003 microns and larger at 0.2 slpm/cm2 while demonstrating a permeability of 3.5×10−12 m2 and a porosity of around 62% is disclosed. The porous media can be fabricated into a frame that is capable of retaining 99.9999999% of particles greater than 0.003 μm in diameter at 8.3 sccm/cm2 with a permeability of 3.0×10−13 m2 and a porosity of around 53%. The porous medias can be tailored by changing the raw materials and process to yield media with a range of porosities and that exhibit permeability between 1.0E−13 and 1.0E−11 m2. The porous media are used in frames for supporting a pellicle and a reticle in a parallel relationship to each other. The frames may comprise porous media in its entirety or the porous media can be fabricated and sealed into a solid support frame.
Public/Granted literature
- US20040109153A1 Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same Public/Granted day:2004-06-10
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