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    Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same
    1.
    发明授权
    Membrane and reticle-pellicle apparatus with purged pellicle-to-reticle gap using same 有权
    膜和掩模版防护薄膜组件，其使用相同的带有防护薄膜 - 标线间隙

    公开(公告)号：US07052809B2

    公开(公告)日：2006-05-30

    申请号：US10677706

    申请日：2003-10-02

    Applicant: Christopher J. Vroman ,  Nathan Abbott

    Inventor： Christopher J. Vroman ,  Nathan Abbott

    IPC: G03F1/14 ,  G03B27/62 ,  B01D46/00 ,  B01D39/20 ,  C22C38/08

    CPC classification number: G03F1/64 ,  G03F7/70933 ,  G03F7/70983

    Abstract: A gas porous media which comprises a material having a low coefficient of thermal expansion that is capable of retaining 99.99% or more of particles of a size of about 0.003 microns and larger at 0.2 slpm/cm2 while demonstrating a permeability of 3.5×10−12 m2 and a porosity of around 62% is disclosed. The porous media can be fabricated into a frame that is capable of retaining 99.9999999% of particles greater than 0.003 μm in diameter at 8.3 sccm/cm2 with a permeability of 3.0×10−13 m2 and a porosity of around 53%. The porous medias can be tailored by changing the raw materials and process to yield media with a range of porosities and that exhibit permeability between 1.0E−13 and 1.0E−11 m2. The porous media are used in frames for supporting a pellicle and a reticle in a parallel relationship to each other. The frames may comprise porous media in its entirety or the porous media can be fabricated and sealed into a solid support frame.

    Abstract translation: 一种气体多孔介质，其包括具有低热膨胀系数的材料，其能够以0.2slpm / cm 2保持尺寸为约0.003微米和更大的颗粒的99.99％或更多，同时展示 渗透率为3.5×10 -2 -2 2，孔隙率为约62％。 多孔介质可以制成框架，该框架能够以8.3sccm / cm 2保持直径大于0.003μm的颗粒的99.9999999％，渗透率为3.0×10 13， SUP> m 2，孔隙率约53％。 多孔介质可以通过改变原料和工艺来制备，以产生具有一定范围的孔隙率的介质，并且其表现出在1.0E-13和1.0E-011之间的渗透率 2 。 多孔介质用于框架中，以彼此平行的关系支撑防护薄膜组件和掩模版。 框架可以包括整体上的多孔介质，或者可以制造多孔介质并将其密封成固体支撑框架。

    Method for digitally controlling a sensor system
    3.
    发明授权
    Method for digitally controlling a sensor system 有权
    数字控制传感器系统的方法

    公开(公告)号：US07010983B2

    公开(公告)日：2006-03-14

    申请号：US10848739

    申请日：2004-05-19

    Applicant: David M. Albert ,  Edwin K. Arrant ,  Marvin B. Edwards

    Inventor： David M. Albert ,  Edwin K. Arrant ,  Marvin B. Edwards

    IPC: G01L7/00

    CPC classification number: G01L27/002 ,  G01D3/022 ,  G01D18/008 ,  G01L9/125 ,  G01L19/02 ,  G01L19/04

    Abstract: Systems and methods for digitally controlling sensors. In one embodiment, a digital controller for a capacitance diaphragm gauge is embedded in a digital signal processor (DSP). The controller receives digitized input from a sensor AFE via a variable gain module, a zero offset module and an analog-to-digital converter. The controller automatically calibrates the received input by adjusting the variable gain and zero offset modules. The controller also monitors and adjusts a heater assembly to maintain an appropriate temperature at the sensor. The controller utilizes a kernel module that allocates processing resources to the various tasks of a gauge controller module. The kernel module repetitively executes iterations of a loop, wherein in each iteration, all of a set of high priority tasks are performed and one of a set of lower priority tasks are performed. The controller module thereby provides sensor measurement output at precisely periodic intervals, while performing ancillary functions as well.

    Abstract translation: 用于数字控制传感器的系统和方法。 在一个实施例中，用于电容隔膜计的数字控制器嵌入在数字信号处理器（DSP）中。 控制器通过可变增益模块，零点偏移模块和模数转换器从传感器AFE接收数字化输入。 控制器通过调整可变增益和零点偏移模块自动校准接收到的输入。 控制器还监控和调整加热器组件以在传感器处保持适当的温度。 控制器利用内核模块，将处理资源分配给量规控制器模块的各种任务。 内核模块重复执行循环的迭代，其中在每次迭代中，执行一组高优先级任务中的所有一个，并且执行一组较低优先级任务中的一个。 因此，控制器模块以精确的周期性间隔提供传感器测量输出，同时执行辅助功能。

    Methods of inserting or removing a species from a substrate
    4.
    发明申请
    Methods of inserting or removing a species from a substrate 审中-公开
    从基材中插入或除去物质的方法

    公开(公告)号：US20050229947A1

    公开(公告)日：2005-10-20

    申请号：US11036585

    申请日：2005-01-13

    Applicant: Jeffrey Spiegelman ,  Daniel Alvarez ,  Joshua Cook

    Inventor： Jeffrey Spiegelman ,  Daniel Alvarez ,  Joshua Cook

    IPC: H01L21/306 ,  H01L21/44

    CPC classification number: B08B7/00 ,  H01L21/02052 ,  H01L21/02057 ,  H01L21/76814 ,  H01L21/76826

    Abstract: Methods of inserting and removing species from substrates utilizing pressure-vent cycling are revealed in embodiments of the invention. Various embodiments introduce a fluid to a vessel containing the substrate while setting pressure at an elevated level. The pressure is maintained at the elevated level for a predetermined period of time, the lowered by removing fluid from the vessel. The steps of introducing fluid, maintaining pressure, and lowering pressure are repeated at least once. Embodiments of the invention may allow a species to be removed from the voids of a substrate, or allow a new species to be inserted into the voids. Particular embodiments also have special application to preconditioning, activating, and/or regenerating gas purification substrates, or removing and/or delivering species with respect to semiconductor substrates. Embodiments of the invention allow faster transport of species to and from substrates with less use of purging or filling fluids.

    Abstract translation: 在本发明的实施方案中揭示了使用压力 - 排气循环从底物中插入和除去物质的方法。 各种实施例在将压力设定在较高水平的同时将流体引入到容纳衬底的容器中。 压力在升高的水平上保持预定的时间，通过从容器中除去流体而降低。 引入流体，保持压力和降低压力的步骤至少重复一次。 本发明的实施方案可以允许物质从基底的空隙中除去，或允许将新物质插入空隙中。 具体实施方案还具有预处理，活化和/或再生气体净化衬底或相对于半导体衬底去除和/或递送物质的特殊应用。 本发明的实施方案允许物种更快地使用清洗或填充液体将物质运送到基底和从基底移走。

    Method for the removal of airborne molecular contaminants using water gas mixtures
    5.
    发明申请
    Method for the removal of airborne molecular contaminants using water gas mixtures 失效
    使用水煤气混合物去除空气传播的分子污染物的方法

    公开(公告)号：US20050205114A1

    公开(公告)日：2005-09-22

    申请号：US11113726

    申请日：2005-04-25

    Applicant: Daniel Alvarez ,  Jeffrey Spiegelman

    Inventor： Daniel Alvarez ,  Jeffrey Spiegelman

    IPC: B01D53/00 ,  B01D53/72 ,  B08B5/02 ,  B08B9/00 ,  H01L21/306 ,  B08B7/00

    CPC classification number: B01D53/00 ,  B01D53/72 ,  B08B5/02 ,  B08B9/00 ,  C23G5/00 ,  H01L21/02046

    Abstract: The present invention discloses a method for the removal of a number of molecular contaminants from surfaces within a device. A purge gas containing oxygen and/or water is introduced into the interior of the device, contacting at least a portion of the interior surfaces. A contaminated purge gas is produced by transferring a portion of the contamination from the interior surfaces into the purge gas. The contaminated purge gas is removed from the device and the process is continued until the contaminant concentration in the contaminated purge gas is below a predetermined level.

    Abstract translation: 本发明公开了一种从装置内的表面除去多种分子污染物的方法。 含有氧气和/或水的净化气体被引入到装置的内部，与内表面的至少一部分接触。 污染的吹扫气体通过将一部分污染物从内表面转移到吹扫气体中而产生。 污染的净化气体从设备中移出，并且继续该过程直到污染的吹扫气体中的污染物浓度低于预定水平。

    Method for forming chromium anisotropic metal particles
    7.
    发明申请
    Method for forming chromium anisotropic metal particles 失效
    形成铬各向异性金属颗粒的方法

    公开(公告)号：US20030200834A1

    公开(公告)日：2003-10-30

    申请号：US10405004

    申请日：2003-03-31

    Applicant: Mykrolis Corporation

    Inventor： Robert S. Zeller ,  Christopher J. Vroman

    IPC: C22C027/06

    CPC classification number: B01D67/0041 ,  B01D39/06 ,  B01D39/2034 ,  B01D39/2044 ,  B01D39/2075 ,  B01D71/022 ,  B22F1/0096 ,  B22F2009/045 ,  B22F2998/10 ,  B22F9/04

    Abstract: A method for forming dendritic metal powders, comprising the steps of: (1) heating a powder comprising non-dendritic particles, under conditions suitable for initial stage sintering, to form a lightly sintered material; and (2) breaking the lightly sintered material to form a powder comprising dendritic particles. In one embodiment, the lightly sintered material is broken by brushing the material through a screen. Another aspect of the present invention comprises the dendritic particles that are produced by the method described above. These particles can comprise any suitable metal, such as transition metals, rare earth metals, main group metals or metalloids or an alloy of two or more such metals. The particles can also comprise a ceramic material, such as a metal oxide. These particles are characterized by a dendritic, highly anisotropic, morphology arising from the fusion of substantially non-dendritic particles, and by a low apparent density relative to the substantially non-dendritic starting material. The present dendritic particles can be of high purity, and substantially free of carbon contamination.

    Abstract translation: 一种形成树枝状金属粉末的方法，包括以下步骤：（1）在适于初始阶段烧结的条件下加热包含非树枝状颗粒的粉末，以形成轻烧结材料; 和（2）破碎轻烧结的材料以形成包含树枝状颗粒的粉末。 在一个实施例中，通过用屏幕刷涂材料来破坏轻度烧结材料。 本发明的另一方面包括通过上述方法制备的树枝状颗粒。 这些颗粒可以包括任何合适的金属，例如过渡金属，稀土金属，主族金属或准金属或两种或更多种这种金属的合金。 颗粒还可以包含陶瓷材料，例如金属氧化物。 这些颗粒的特征在于由基本上非树枝状颗粒的融合产生的树枝状，高度各向异性的形态，以及相对于基本上非树枝状起始材料的低表观密度。 本发明的树枝状颗粒可以是高纯度的，并且基本上没有碳污染。

    Fluid Treating Apparatus
    8.
    发明申请
    Fluid Treating Apparatus 审中-公开
    流体处理设备

    公开(公告)号：US20090001019A1

    公开(公告)日：2009-01-01

    申请号：US11628278

    申请日：2005-06-03

    Applicant: Ariel Frometa ,  Christopher Wargo ,  Joseph Zahka ,  Yasuji Suzuki

    Inventor： Ariel Frometa ,  Christopher Wargo ,  Joseph Zahka ,  Yasuji Suzuki

    IPC: B01D35/01 ,  B01D65/00 ,  B01D61/30 ,  B01D61/10 ,  B01D61/20 ,  B01D61/00 ,  B01D19/00

    CPC classification number: B01D61/00 ,  B01D19/0031 ,  B01D69/02 ,  B01D2325/12 ,  B01D2325/38

    Abstract: Embodiments of the present invention are directed to an apparatus that can be used to treat fluids. The apparatus can include a housing with an inlet for receiving a process fluid to be treated, a surface within the housing for treating the process fluid that can be wet by the process fluid, and an outlet for removing treated process fluid. The housing includes a vent that aids in the removal of fluid components that separate from the process fluid. Removal of these separated fluids improves the efficiency and contact of the process fluid with the surfaces in the housing for treating the process fluid.

    Abstract translation: 本发明的实施例涉及可用于处理流体的装置。 该装置可以包括具有用于接收待处理的处理流体的入口的壳体，用于处理可被过程流体润湿的过程流体的壳体内的表面，以及用于去除处理过的流体的出口。 壳体包括有助于去除与工艺流体分离的流体组分的排气口。 去除这些分离的流体提高了处理流体与壳体中用于处理工艺流体的表面的效率和接触。

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