Invention Grant
US07061601B2 System and method for double sided optical inspection of thin film disks or wafers
失效
用于薄膜盘或晶片双面光学检测的系统和方法
- Patent Title: System and method for double sided optical inspection of thin film disks or wafers
- Patent Title (中): 用于薄膜盘或晶片双面光学检测的系统和方法
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Application No.: US10754275Application Date: 2004-01-08
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Publication No.: US07061601B2Publication Date: 2006-06-13
- Inventor: Steven W. Meeks
- Applicant: Steven W. Meeks
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corporation
- Current Assignee: KLA-Tencor Technologies Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Cavon & Aghevli LLC
- Main IPC: G01N21/00
- IPC: G01N21/00

Abstract:
A double-sided optical inspection system is presented which may detect and classify particles, pits and scratches on thin film disks or wafers in a single scan of the surface. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction on both surfaces of the wafer or thin film disk. The scattered light from radial and circumferential beams is separated via their polarization or by the use of a dichroic mirror together with two different laser wavelengths.
Public/Granted literature
- US20040169850A1 System and method for double sided optical inspection of thin film disks or wafers Public/Granted day:2004-09-02
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