Invention Grant
US07061601B2 System and method for double sided optical inspection of thin film disks or wafers 失效
用于薄膜盘或晶片双面光学检测的系统和方法

System and method for double sided optical inspection of thin film disks or wafers
Abstract:
A double-sided optical inspection system is presented which may detect and classify particles, pits and scratches on thin film disks or wafers in a single scan of the surface. In one embodiment, the invention uses a pair of orthogonally oriented laser beams, one in the radial and one in the circumferential direction on both surfaces of the wafer or thin film disk. The scattered light from radial and circumferential beams is separated via their polarization or by the use of a dichroic mirror together with two different laser wavelengths.
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