发明授权
- 专利标题: Fine particle structure and optical medium
- 专利标题(中): 细颗粒结构和光学介质
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申请号: US10764735申请日: 2004-01-26
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公开(公告)号: US07063890B2公开(公告)日: 2006-06-20
- 发明人: Atsushi Toda , Yuriko Kaino , Hirotaka Akao , Ko Ishimoto
- 申请人: Atsushi Toda , Yuriko Kaino , Hirotaka Akao , Ko Ishimoto
- 申请人地址: JP Tokyo
- 专利权人: Sony Corporation
- 当前专利权人: Sony Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Frommer Lawrence & Haug LLP
- 代理商 William S. Frommer
- 优先权: JP2003-018490 20030128
- 主分类号: B32B5/16
- IPC分类号: B32B5/16
摘要:
Such a structure is to be provided in that in the case where a material, such as a protective film, is coated on a fine particle accumulated layer, such as a photonic crystal, penetration of the material into gaps among the fine particles is suppressed, whereby the mechanical strength against bending stress and tensile stress is improved, and peeling and breakage of the fine particle accumulated layer are suppressed, without adverse affect on the optical characteristics, such as reflection characteristics. The fine particle structure contains a visible light absorbing material absorbing visible light as a substrate, having accumulated thereon in this order silica fine particles having a particle diameter of 290 nm as a fine particle layer for reflecting red light, silica fine particles having a particle diameter of 240 nm as a fine particle layer for reflecting green light, and silica fine particles having a particle diameter of 210 nm as a fine particle layer for reflecting blue light, and further provided thereon a polymer layer or a gelatin layer containing a polymer having a size larger than the gaps among the fine particles. The optical medium, such as a reflective type screen, further contains a diffusion film on the polymer layer or the gelatin layer.
公开/授权文献
- US20040224154A1 Fine particle structure and optical medium 公开/授权日:2004-11-11
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