发明授权
- 专利标题: Method of dressing polishing pad and polishing apparatus
- 专利标题(中): 抛光垫和抛光装置的修整方法
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申请号: US10941083申请日: 2004-09-15
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公开(公告)号: US07066786B2公开(公告)日: 2006-06-27
- 发明人: Tatsuya Fujishima , Katsumi Sameshima
- 申请人: Tatsuya Fujishima , Katsumi Sameshima
- 申请人地址: JP Osaka JP Kyoto
- 专利权人: Sanyo Electric Co., Ltd.,Rohm Co., Ltd.
- 当前专利权人: Sanyo Electric Co., Ltd.,Rohm Co., Ltd.
- 当前专利权人地址: JP Osaka JP Kyoto
- 代理机构: Morrison & Foerster LLP
- 优先权: JP2003-324898 20030917
- 主分类号: B24B53/00
- IPC分类号: B24B53/00
摘要:
A method to quantitatively detect an optimum endpoint of dressing of a polishing pad with a non-destructive monitoring of a surface of the polishing pad is offered. The polishing pad is dressed for a predetermined period, and roughness of the surface of the polishing pad is measured with an optical measurement device made of a laser focus displacement meter. Then a characteristic curve representing a correlation between surface roughness of the polishing pad and dressing time is obtained. A gradient of the surface roughness versus dressing time characteristic curve is obtained. Dressing is stopped when the gradient reaches a predetermined value of gradient. These steps are repeated until the gradient of the surface roughness versus dressing time characteristic curve reaches the predetermined value of gradient.
公开/授权文献
- US20050090185A1 Method of dressing polishing pad and polishing apparatus 公开/授权日:2005-04-28
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