发明授权
- 专利标题： Exposure apparatus, method of controlling same, and method of manufacturing devices
- 专利标题（中）： 曝光装置及其控制方法以及制造装置的方法
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申请号： US10961205申请日： 2004-10-12
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公开(公告)号： US07072027B2公开(公告)日： 2006-07-04
- 发明人: Takehiko Iwanaga
- 申请人： Takehiko Iwanaga
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2001-276745 20010912
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03B27/62
摘要：
A scanning exposure apparatus includes a projection optical system which projects a pattern formed on a mask onto an object, a stage which holds an object and moves in a direction perpendicular to an optical axis of the projection optical system, a measurement system which measures a position of a surface of the object in a direction of the optical axis in response to a reset signal, and a generation system which generates the reset signal when the stage arrives at each predetermined position in the direction perpendicular to the optical axis.