发明授权
- 专利标题： Reflection type mask
- 专利标题（中）： 反射型面具
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申请号： US10736693申请日： 2003-12-17
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公开(公告)号： US07072438B2公开(公告)日： 2006-07-04
- 发明人: Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
- 申请人： Keiko Chiba , Masami Tsukamoto , Yutaka Watanabe , Shinichi Hara , Hiroshi Maehara
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP8-123594 19960517; JP8-133516 19960528
- 主分类号： G21K3/00
- IPC分类号： G21K3/00
摘要：
A reflection type mask includes a substrate on which a multi-layered film for reflecting X-rays is provided, a mask pattern which is formed on the multi-layered film for absorbing the X-rays, and a cover for protecting the mask pattern. The cover is detachably attached to the substrate.
公开/授权文献
- US20040125911A1 Reflection type mask 公开/授权日：2004-07-01
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