Invention Grant
- Patent Title: Apparatus control system, apparatus control method, semiconductor exposure apparatus, semiconductor exposure apparatus control method and semiconductor device manufacturing method
- Patent Title (中): 装置控制系统，装置控制方法，半导体曝光装置，半导体曝光装置控制方法和半导体装置制造方法
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Application No.: US10269984Application Date: 2002-10-15
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Publication No.: US07075618B2Publication Date: 2006-07-11
- Inventor: Hideki Ina , Takehiko Suzuki , Koichi Sentoku , Takahiro Matsumoto , Satoru Oishi
- Applicant: Hideki Ina , Takehiko Suzuki , Koichi Sentoku , Takahiro Matsumoto , Satoru Oishi
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2001-319452 20011017
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/32
Abstract:
A system for controlling an apparatus. The system includes an operating device for operating the apparatus based on a first parameter value and a second parameter value, an inspecting device for inspecting operation results of the apparatus corresponding to the first parameter value, an estimating device for estimating operation results of the apparatus corresponding to the first parameter value on the basis of the operation results corresponding to the first parameter value, and a revising device for revising parameter values to operate the apparatus on the basis of the operation results obtained by the inspecting device and the estimated operation results obtained by the estimating device.
Public/Granted literature
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