Invention Grant
- Patent Title: Extended kalman filter incorporating offline metrology
- Patent Title (中): 扩展卡尔曼滤波器结合离线计量
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Application No.: US10232854Application Date: 2002-08-28
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Publication No.: US07087527B2Publication Date: 2006-08-08
- Inventor: Jim Hofmann
- Applicant: Jim Hofmann
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Schwegman, Lundberg, Woessner & Kluth, P.A.
- Main IPC: H01L21/302
- IPC: H01L21/302

Abstract:
An algorithm uses offline metrology to control a process by passing information from an outer control loop to an inner control loop, extended Kalman filter estimator. The inner control loop operates online, and the outer control loop operates asynchronously with respect to the inner control loop. The online control loop is updated for each subsequent process. The offline metrology is optionally updated for each subsequent process.
Public/Granted literature
- US20040043700A1 Extended kalman filter incorporating offline metrology Public/Granted day:2004-03-04
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