Invention Grant
- Patent Title: Photon source and a method of fabricating a photon source
- Patent Title (中): 光子源和制造光子源的方法
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Application No.: US10860484Application Date: 2004-06-04
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Publication No.: US07087923B2Publication Date: 2006-08-08
- Inventor: Martin Brian Ward , Andrew James Shields
- Applicant: Martin Brian Ward , Andrew James Shields
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- Priority: GB0314771.7 20030624
- Main IPC: H01L29/06
- IPC: H01L29/06

Abstract:
A photon source comprising a quantum dot layer having a plurality of quantum dots with an n-modal distribution in emission wavelength, said n-modal distribution in emission wavelength comprising n peaks in a plot of dot density as a function of emission wavelength where n is an integer of at least 2, the photon source further comprising isolating means for isolating the emission from a predetermined number of quantum dots.
Public/Granted literature
- US20050161660A1 Photon source and a method of fabricating a photon source Public/Granted day:2005-07-28
Information query
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