发明授权
- 专利标题： Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
- 专利标题（中）： 曝光装置，光学投影装置和调整光学投影装置的方法
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申请号： US11101553申请日： 2005-04-08
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公开(公告)号： US07088425B2公开(公告)日： 2006-08-08
- 发明人: Masashi Tanaka , Masaki Kato
- 申请人： Masashi Tanaka , Masaki Kato
- 申请人地址： JP Tokyo
- 专利权人： Nikon Corporation
- 当前专利权人： Nikon Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Oliff & Berridge PLC
- 优先权： JP161588/1993 19930630; JP345619/1993 19931222; JP116800/1994 19940530; JP123762/1994 19940606; JP141326/1994 19940623; JP177898/1994 19940729; JP200494/1994 19940825
- 主分类号： G03B27/32
- IPC分类号： G03B27/32 ; G03B27/54 ; G03G27/44
摘要：
An exposure apparatus includes a plurality of projection optical systems and a substrate stage. Each of the plurality of projection optical systems forms an exposure field on the substrate. The substrate stage holds the substrate and moves in at least a scanning direction extending in a straight line. The plurality of exposure fields are arranged along a direction crossing the scanning direction. The plurality of projection optical systems and the substrate relatively move during an exposure field forming operation along the scanning direction.
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