Invention Grant
- Patent Title: Fast recovery diode with a single large area p/n junction
- Patent Title (中): 具有单个大面积p / n结的快速恢复二极管
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Application No.: US11233760Application Date: 2005-09-23
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Publication No.: US07091572B2Publication Date: 2006-08-15
- Inventor: Kohji Andoh , Silvestro Fimiani , Fabrizio Rue Redda , Davide Chiola
- Applicant: Kohji Andoh , Silvestro Fimiani , Fabrizio Rue Redda , Davide Chiola
- Applicant Address: US CA El Segundo
- Assignee: International Rectifier Corporation
- Current Assignee: International Rectifier Corporation
- Current Assignee Address: US CA El Segundo
- Agency: Ostrolenk, Faber, Gerb & Soffen, LLP
- Main IPC: H01L29/861
- IPC: H01L29/861 ; H01L31/107

Abstract:
A fast recovery diode has a single large area P/N junction surrounded by a termination region. The anode contact in contact with the central active area extends over the inner periphery of an oxide termination ring and an EQR metal ring extends over the outer periphery of the oxide termination ring. Platinum atoms are diffused into the back surface of the device. A three mask process is described. An amorphous silicon layer is added in a four mask process, and a plurality of spaced guard rings are added in a five mask process.
Public/Granted literature
- US20060017130A1 Fast recovery diode with a single large area P/N junction Public/Granted day:2006-01-26
Information query
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